Current-Transport Mechanisms in the AlInN/AlN/GaN single-channel and AlInN/AlN/GaN/AlN/GaN double-channel heterostructures

dc.contributor.authorArslan, Engin
dc.contributor.authorTurhan, Sevil
dc.contributor.authorGökden, Sibel
dc.contributor.authorTeke, Ali
dc.contributor.authorÖzbay, Ekmelen_US
dc.date.accessioned2019-07-25T08:43:40Z
dc.date.available2019-07-25T08:43:40Z
dc.date.issued2013en_US
dc.departmentFakülteler, Fen-Edebiyat Fakültesi, Fizik Bölümüen_US
dc.descriptionTurhan, Sevil (Balikesir Author)en_US
dc.description.abstractCurrent-transport mechanisms were investigated in Schottky contacts on AlInN/AlN/GaN single channel (SC) and AlInN/AlN/GaN/AlN/GaN double channel (DC) heterostructures. A simple model was adapted to the current-transport mechanisms in DC heterostructure. In this model, two Schottky diodes are in series: one is a metal-semiconductor barrier layer (AIInN) Schottky diode and the other is an equivalent Schottky diode, which is due to the heterojunction between the AlN and GaN layer. Capacitance-voltage studies show the formation of a two-dimensional electron gas at the AlN/GaN interface in the SC and the first AlN/GaN interface from the substrate direction in the DC. In order to determine the current mechanisms for SC and DC heterostructures, we fit the analytical expressions given for the tunneling current to the experimental current-voltage data over a wide range of applied biases as well as at different temperatures. We observed a weak temperature dependence of the saturation current and a fairly small dependence on the temperature of the tunneling parameters in this temperature range. At both a low and medium forward-bias voltage values for Schottky contacts on AlInN/AlN/GaN/AlN/GaN DC and AlInN/AlN/GaN SC heterostructures, the data are consistent with electron tunneling to deep levels in the vicinity of mixed/screw dislocations in the temperature range of 80-420 K.en_US
dc.description.sponsorshipDPT-HAMIT project ESF-EPIGRAT project Turkish Academy of Sciences - EU-N4E NATO-SET-181en_US
dc.identifier.doi10.1016/j.tsf.2013.09.026
dc.identifier.endpage418en_US
dc.identifier.issn0040-6090
dc.identifier.issue548en_US
dc.identifier.scopus2-s2.0-84887427717
dc.identifier.scopusqualityQ2
dc.identifier.startpage411en_US
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2013.09.026
dc.identifier.urihttps://hdl.handle.net/20.500.12462/5685
dc.identifier.wosWOS:000327530300066
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoenen_US
dc.publisherElsevier Science Saen_US
dc.relation.ispartofThin Solid Filmsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.relation.tubitakinfo:eu-repo/grantAgreement/TUBITAK/107A004en_US
dc.relation.tubitakinfo:eu-repo/grantAgreement/TUBITAK/107A012en_US
dc.relation.tubitakinfo:eu-repo/grantAgreement/TUBITAK/109E301en_US
dc.rightsinfo:eu-repo/semantics/embargoedAccessen_US
dc.subjectAlInN/AlN/GaN Single Channel Heterostructuresen_US
dc.subjectAlInN/AlN/GaN/AlN/GaN Double Channelen_US
dc.subjectHeterostructuresen_US
dc.subjectTunneling Currenten_US
dc.subjectSchottky Contacten_US
dc.titleCurrent-Transport Mechanisms in the AlInN/AlN/GaN single-channel and AlInN/AlN/GaN/AlN/GaN double-channel heterostructuresen_US
dc.typeArticleen_US

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