Sputtered fecl/cu multilayer thin films: effect of different thicknesses of cu layer

Abstract

A series of FeCl/Cu multilayer thin films was deposited with different thicknesses of Cu layer. The multilayers were sputtered with a two dc magnetrons system. The effect of different thicknesses of Cu layer on the properties of the films was investigated. The Cu content in the films gradually increased from 0 at.% to 47 at.% as the Cu layer thickness was increased from 0 rim to 24 nm. According to crystal structure analysis, the intensities of the peaks which belong to the face centered cubic planes increased with increasing Cu content of the films. Modest and mirror-like surfaces were observed in all images obtained by a scanning electron microscope. Magnetic measurements indicated that magnetization decreased with increasing Cu contents in the multilayer thin films. The magnetization of the film without Cu was 1473 emu/cm(3) while the value of 348 emu/cm(3)was detected for the film with 24 nm Cu layer thickness.