Comparison of Ni-Cu alloy films electrodeposited at low and high pH levels

dc.authorid0000-0002-4862-0490en_US
dc.contributor.authorAlper, Mürsel
dc.contributor.authorKöçkar, Hakan
dc.contributor.authorŞafak, Mürşide
dc.contributor.authorBaykul, M. Celalettin
dc.date.accessioned2019-10-17T11:06:54Z
dc.date.available2019-10-17T11:06:54Z
dc.date.issued2008en_US
dc.departmentFakülteler, Fen-Edebiyat Fakültesi, Fizik Bölümüen_US
dc.descriptionKöçkar, Hakan (Balikesir Author)en_US
dc.description.abstractNi-Cu alloy films were potentiostatically electrodeposited from the electrolytes with low pH (2.0) and high pH (3.3) levels. The structural analysis of the films was carried out using the X-ray diffraction (XRD) and scanning electron microscopy (SEM) techniques. The XRD data showed that the crystal texture degree was different for the films grown at high pH and low pH. At high pH, the films have a strong (100) texture of the face-centred cubic (fcc) structure, while for the films at low pH the crystal planes are randomly oriented, as in a powder pattern of Cu (or Ni). The SEM studies revealed that the surface morphology of the films strongly depend on the electrolyte pH. Furthermore, the magnetic characteristics studied by a vibrating sample magnetometer (VSM) and magnetotransport properties were observed to be affected by the electrolyte pH. The differences observed in the magnetic and magnetotransport properties were attributed to the structural changes caused by the electrolyte pH.en_US
dc.identifier.doi10.1016/j.jallcom.2006.11.066
dc.identifier.endpage19en_US
dc.identifier.issn0925-8388
dc.identifier.issue1-2en_US
dc.identifier.scopus2-s2.0-40149100946
dc.identifier.scopusqualityQ1
dc.identifier.startpage15en_US
dc.identifier.urihttps://doi.org/10.1016/j.jallcom.2006.11.066
dc.identifier.urihttps://hdl.handle.net/20.500.12462/8440
dc.identifier.volume453en_US
dc.identifier.wosWOS:000254899700006
dc.identifier.wosqualityQ1
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoenen_US
dc.publisherElsevier Science Saen_US
dc.relation.ispartofJournal of Alloys and Compoundsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectNi-Cu Filmsen_US
dc.subjectElectrodepositionen_US
dc.subjectXRDen_US
dc.subjectSEMen_US
dc.subjectMagnetoresistanceen_US
dc.titleComparison of Ni-Cu alloy films electrodeposited at low and high pH levelsen_US
dc.typeArticleen_US

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