The effect of interface-roughness and dislocation scattering on low temperature mobility of 2D electron gas in GaN/AlGaN

dc.contributor.authorZanato, D
dc.contributor.authorGökden, Sibel
dc.contributor.authorBalkan, Naci
dc.contributor.authorRidley, Brian
dc.contributor.authorSchaff, William J.
dc.date.accessioned2019-10-17T07:09:09Z
dc.date.available2019-10-17T07:09:09Z
dc.date.issued2004en_US
dc.departmentFakülteler, Fen-Edebiyat Fakültesi, Fizik Bölümüen_US
dc.descriptionGökden, Sibel (Balikesir Author)en_US
dc.description.abstractWe present the results of our experimental and theoretical studies concerning the temperature dependence of electron mobility in a two-dimensional electron gas (2DEG) confined at the GaN/AlGaN interface. Experimental mobility of 2912 cm(2) (V s)(-1) at 4.2 K, remains almost constant up to lattice temperature T-L = 150 K, it then decreases rapidly down to 1067 cm 2 (V s)-1 at TL = 300 K. In order to compare the experimental results with the theory we use a simple analytical formula for low-field electron mobility based on 2D degenerate statistics for a 2DEG confined in a triangular well. We consider acoustic phonon, polar-optical phonon, dislocation and interface-roughness (IFR) scattering. The polar-optical phonon scattering is the dominant mechanism at high temperatures. At low temperatures, however, both the IFR and dislocation scattering explain, equally well, the observed mobility. In reality, however, a mixture of the two mechanisms together with the deformation potential and piezoelectric scattering will determine the low temperature mobility. The experimental results are discussed in the light of the calculations.en_US
dc.identifier.doi10.1088/0268-1242/19/3/024
dc.identifier.endpage432en_US
dc.identifier.issn0268-1242
dc.identifier.issn1361-6641
dc.identifier.issue3en_US
dc.identifier.scopus2-s2.0-1642335549
dc.identifier.scopusqualityQ2
dc.identifier.startpage427en_US
dc.identifier.urihttps://doi.org/10.1088/0268-1242/19/3/024
dc.identifier.urihttps://hdl.handle.net/20.500.12462/7509
dc.identifier.volume19en_US
dc.identifier.wosWOS:000220420500033
dc.identifier.wosqualityQ1
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoenen_US
dc.publisherIOP Publishing Ltden_US
dc.relation.ispartofSemiconductor Science and Technologyen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/embargoedAccessen_US
dc.subjectQuantum-Wellsen_US
dc.subjectSemiconductor İnterfacesen_US
dc.subjectInversion-Layersen_US
dc.subjectHeterostructuresen_US
dc.subjectDependenceen_US
dc.subjectHeterojunctionen_US
dc.subjectGrowthen_US
dc.subjectFielden_US
dc.subjectTransporten_US
dc.subjectPhononsen_US
dc.titleThe effect of interface-roughness and dislocation scattering on low temperature mobility of 2D electron gas in GaN/AlGaNen_US
dc.typeArticleen_US

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