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dc.contributor.authorÇapan, Rifat
dc.contributor.authorAlp, İbrahim
dc.contributor.authorRichardson, Tim
dc.contributor.authorDavis, Frank
dc.date.accessioned2019-10-17T08:02:24Z
dc.date.available2019-10-17T08:02:24Z
dc.date.issued2005en_US
dc.identifier.issn0167-577X
dc.identifier.urihttps://doi.org/ 10.1016/j.matlet.2005.02.032
dc.identifier.urihttps://hdl.handle.net/20.500.12462/7832
dc.descriptionÇapan, Rifat (Balıkesir Author)en_US
dc.description.abstractIn this work calix [4] acid (A) has been deposited alternately with calix [4] amine (B) using the LB film deposition technique to form a non-centrosymmetric ABABA... molecular architecture. Pyroelectric and dielectric electric measurements have been performed for a 31 layer calix [4] acid/amine alternate layer LB film. Pyroelectric coefficients for this LB film system have been obtained using a quasi-static measurement system. Dielectric measurements have been used to determine the dielectric constant and the dielectric loss tangent. The data obtained from pyroelectric and dielectric measurements have been used to calculate the figure of merit for these LB film systems which has a value of 2.56 mu C m(-2) K-1. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoengen_US
dc.publisherElsevier Science Bven_US
dc.relation.isversionof10.1016/j.matlet.2005.02.032en_US
dc.rightsinfo:eu-repo/semantics/embargoedAccessen_US
dc.subjectPyroelectric Effecten_US
dc.subjectDielectricityen_US
dc.subjectLB Filmsen_US
dc.subjectCalixareneen_US
dc.titlePyroelectric figure of merit for a calix [4] acid/amine alternate layer Langmuir-Blodgett filmen_US
dc.typearticleen_US
dc.relation.journalMaterials Lettersen_US
dc.contributor.departmentFen Edebiyat Fakültesien_US
dc.contributor.authorID0000-0002-2669-9169en_US
dc.contributor.authorID0000-0003-3222-9056en_US
dc.identifier.volume59en_US
dc.identifier.issue14-15en_US
dc.identifier.startpage1945en_US
dc.identifier.endpage1948en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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