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dc.contributor.authorDoğan, Seydi
dc.contributor.authorTeke, Ali
dc.contributor.authorHuang, Daming
dc.contributor.authorMorkoc, Hadis H.
dc.contributor.authorRoberts, CB
dc.contributor.authorParish, John
dc.contributor.authorGanguly, Biswa
dc.date.accessioned2019-10-17T07:58:41Z
dc.date.available2019-10-17T07:58:41Z
dc.date.issued2003en_US
dc.identifier.issn0003-6951
dc.identifier.uri10.1063/1.1571667
dc.identifier.urihttps://hdl.handle.net/20.500.12462/7806
dc.descriptionTeke, Ali (Balikesir Author)en_US
dc.description.abstractSilicon carbide is a wide-band-gap semiconductor suitable for high-power high-voltage devices and it has excellent properties for use in photoconductive semiconductor switches (PCSSs). PCSS were fabricated as planar structures on high-resistivity 4H-SiC and tested at dc bias voltages up to 1000 V. The typical maximum photocurrent of the device at 1000 V was about 49.4 A. The average on-state resistance and the ratio of on-state to off-state currents were about 20 Omega and 3x10(11), respectively. Photoconductivity pulse widths for all applied voltages were 8-10 ns. These excellent results are due in part to the removal of the surface damage by high-temperature H-2 etching and surface preparation. Atomic force microscopy images revealed that very good surface morphology, atomic layer flatness, and large step width were achieved.en_US
dc.language.isoengen_US
dc.publisherAmer Inst Physicsen_US
dc.relation.isversionof10.1063/1.1571667en_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.title4H-SiC photoconductive switching devices for use in high-power applicationsen_US
dc.typearticleen_US
dc.relation.journalApplied Physics Lettersen_US
dc.contributor.departmentFen Edebiyat Fakültesien_US
dc.contributor.authorID0000-0001-9785-4990en_US
dc.contributor.authorID0000-0001-7514-762Xen_US
dc.identifier.volume82en_US
dc.identifier.issue18en_US
dc.identifier.startpage3107en_US
dc.identifier.endpage3109en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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