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dc.contributor.authorŞen, Sevde Nur
dc.contributor.authorÇapan, Rifat
dc.contributor.authorÖzel, Mehmet Emin
dc.contributor.authorHassan, Aseel K.
dc.contributor.authorTurhan, Onur
dc.contributor.authorNamlı, Hilmi
dc.date.accessioned2019-10-16T11:28:31Z
dc.date.available2019-10-16T11:28:31Z
dc.date.issued2011en_US
dc.identifier.issn1842-6573
dc.identifier.urihttps://hdl.handle.net/20.500.12462/7095
dc.descriptionÇapan, Rifat (Balıkesir Author)en_US
dc.description.abstractSpin coating technique is employed to produce thin phthalimide films using novel p-phthalimidobenzoic acid (FIBA) and N-(phthalimido)-p-aminobenzoic acid (FIABA) materials. Several spin speeds and various solution concentrations are chosen to monitor the thin film deposition process of these new materials. The optical properties are studied using UV-visible spectroscopy and spectroscopic ellipsometry methods. The absorption of the FIBA and FIABA films against the spin speed showed an exponential behavior. pi -> pi* transition is occurred. The thicknesses of thin films at 2000 rpm are obtained 15.86 nm for FIBA and 12.99 nm for FIABA using spectroscopic ellipsometry results.en_US
dc.description.sponsorshipOnsekiz Mart University Research Council Foundation 2005/111en_US
dc.language.isoengen_US
dc.publisherNatl Inst Optoelectronıcs,en_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectPhthalimidesen_US
dc.subjectSpun Filmsen_US
dc.subjectUV-Vis Spectroscopyen_US
dc.subjectSpectroscopic Ellipsometryen_US
dc.titleThin film characterization of novel phthalimide materialsen_US
dc.typearticleen_US
dc.relation.journalOptoelectronics and Advanced Materials-Rapid Communicationsen_US
dc.contributor.departmentFen Edebiyat Fakültesien_US
dc.identifier.volume5en_US
dc.identifier.issue11en_US
dc.identifier.startpage1243en_US
dc.identifier.endpage1247en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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